Blue Wave Substrate/Wafer rotation products are capable of reaching up 700˚C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert (Ar, N2, He, H2) and reactive O2, CO2, C2H2, CH4, NH3, SiH4, and metal-organic precursors, compatible to vacuum 10E-8 Torr through processing gas pressure of 1 atm. It has integrated inbuilt K-type thermocouple mounted from backside approaching near the surface of the susceptor. Heater element is sealed against exposure to reactive gases and high density plasma in PECVD and RF/DC sputtering, and laser ablation processes. Substrate heater is suitable for epitaxial growth, doping, catalytic reactions, in-situ surface science as a function of temperature, and annealing of oxides, nitrides, carbides, metals, alloys, graphene, CNTs, diamond and complex multicomponent and multilayer thin films. www.bluewavesemi.com.
Comments